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 <front>
  <journal-meta>
   <journal-id journal-id-type="publisher-id">Bulletin of Bryansk state technical university</journal-id>
   <journal-title-group>
    <journal-title xml:lang="en">Bulletin of Bryansk state technical university</journal-title>
    <trans-title-group xml:lang="ru">
     <trans-title>Вестник Брянского государственного технического университета</trans-title>
    </trans-title-group>
   </journal-title-group>
   <issn publication-format="print">1999-8775</issn>
  </journal-meta>
  <article-meta>
   <article-id pub-id-type="publisher-id">14350</article-id>
   <article-id pub-id-type="doi">10.12737/23189</article-id>
   <article-categories>
    <subj-group subj-group-type="toc-heading" xml:lang="ru">
     <subject>Машиностроение и транспорт</subject>
    </subj-group>
    <subj-group subj-group-type="toc-heading" xml:lang="en">
     <subject>Mechanical engineering and transport</subject>
    </subj-group>
    <subj-group>
     <subject>Машиностроение и транспорт</subject>
    </subj-group>
   </article-categories>
   <title-group>
    <article-title xml:lang="en">Development process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD).</article-title>
    <trans-title-group xml:lang="ru">
     <trans-title>РАЗРАБОТКА ПРОЦЕССА АССИСТИРУЕМОГО  ФИЛЬТРУЕМОГО ВАКУУМНО-ДУГОВОГО ОСАЖДЕНИЯ</trans-title>
    </trans-title-group>
   </title-group>
   <contrib-group content-type="authors">
    <contrib contrib-type="author">
     <name-alternatives>
      <name xml:lang="ru">
       <surname>Верещака  </surname>
       <given-names>Алексей Анатольевич</given-names>
      </name>
      <name xml:lang="en">
       <surname>Vereshchaka  </surname>
       <given-names>Aleksey Анатольевич</given-names>
      </name>
     </name-alternatives>
     <email>ectech@rambler.ru</email>
    </contrib>
   </contrib-group>
   <pub-date publication-format="print" date-type="pub" iso-8601-date="2016-12-07T00:00:00+03:00">
    <day>07</day>
    <month>12</month>
    <year>2016</year>
   </pub-date>
   <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2016-12-07T00:00:00+03:00">
    <day>07</day>
    <month>12</month>
    <year>2016</year>
   </pub-date>
   <volume>2014</volume>
   <issue>3</issue>
   <fpage>10</fpage>
   <lpage>13</lpage>
   <self-uri xlink:href="https://zh-szf.ru/en/nauka/article/14350/view">https://zh-szf.ru/en/nauka/article/14350/view</self-uri>
   <abstract xml:lang="ru">
    <p>Разработан процесс ассистируемого фильтруемого вакуумно-дугового осаждения наноструктурированных многослойных покрытий. Использован источник  ассистирующих высокоэнергетических ионов, оснащаемый различными катодами (Cr, Mo). Исследованы основные  параметры покрытий, включающие состав, структуру, толщину, твёрдость, адгезию по отношению к субстрату в зависимости от условий ассистирую-щей импульсной ионной имплантации. Разработана феноменологическая (физическая) модель процесса вакуумно-дугового осаждения покрытий, ассистируемого высокоэнергетическими ионами (AFCVAD),    позволяющая прогнозировать свойства формируемых покрытий на основе бинарных соединений.</p>
   </abstract>
   <trans-abstract xml:lang="en">
    <p>Developed a process of assisted filtered cathodic-vacuum-arc deposition (AFCVAD). We used a special emitter  (implantor) to generate Cr, Mo ions with high energy. Such key parameters of coatings as composition, structure, a thickness, hardness, adhesion in relation to a substrate obtained at various energy of chrome ions have been studied. A phenomenological (physical) model of assisted filtered cathodic-vacuum-arc deposition (AFCVAD), allows to predict the properties of the coatings formed on the basis of binary compounds as a function of the relationship Ra, characterizing parameters of ion implantation.</p>
   </trans-abstract>
   <kwd-group xml:lang="ru">
    <kwd>ассистируемое фильтруемое вакуумно-дуговое осаждение</kwd>
    <kwd>АФВДО</kwd>
    <kwd>ионная имплантация</kwd>
    <kwd>износостойкие покрытия.</kwd>
   </kwd-group>
   <kwd-group xml:lang="en">
    <kwd>assisted filtered cathodic-vacuum-arc deposition</kwd>
    <kwd>ion implantation</kwd>
    <kwd>wear-resistant coatings.</kwd>
   </kwd-group>
  </article-meta>
 </front>
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