TECHNOLOGIES FOR CREATING RADIATION-RESISTANT VLSI
Abstract and keywords
Abstract (English):
The technology of radiation-resistant CMOS VLSI is based on industrial IC technology. The design uses feedback circuits and guard rings to compensate for single effects of cosmic particles (SEE). In most critical cases, these influences in digital circuits lead to single faults (SEU), which temporarily disrupt the state of memory cells, to latching (SEL), and in the long term to a catastrophic change of state. Various space programs confirm great prospects for their use in future space structures. The article discusses the effects of using radiation-resistant CMOS technology, technology based on a silicon-on-sapphire structure, CMOS technology on an insulating substrate taking into account typical characteristics, SIMOX-SOI technology, which consists in separation by implantation of oxygen ions. In new designs of circuits, more advanced algorithms should be implemented for the future.

Keywords:
Functioning, technological process, radiation resistance, CMOS technology, methodology for creating circuits, specialized processors
References

1. Semkin, N.D. Calculating the current in the measurement circuit of a high-velocity microparticle detector / N.D. Semkin, A.M. Telegin // Measurement techniques. - 2017. - T. 59, № 12. - S. 1304-1309. - DOI:https://doi.org/10.1007/s11018-017-1133-3

2. Radiacionnye usloviya na orbite i poverhnosti Marsa / I.P. Bezrodnyh, E.I. Morozova, A.A. Petrukovich, V.T. Semenov // Voprosy elektromehaniki. Trudy VNIIEM. - 2014. - T. 138, № 1. - S. 53-57.

3. Sovremennye usloviya ekspluatacii mikroshem kosmicheskogo naznacheniya / V.K. Zol'nikov, V.P. Kryukov, A.Yu. Kulay [i dr.] // Informacionnye tehnologii v upravlenii i modelirovanii mehatronnyh sistem. materialy 1-y nauchno-prakticheskoy mezhdunarodnoy konferencii. - Tambov, 2017. - S. 119-126.

4. Algoritmicheskaya osnova modelirovaniya i obespecheniya zaschity tipovyh KMOP elementov v processe proektirovaniya / V.K Zol'nikov, V.A. Smerek, V.I. Anciferova, S.A. Evdokimova // Modelirovanie sistem i processov. - 2013. - № 3. - S. 14-16. - DOI:https://doi.org/10.12737/2382

5. Razrabotka proektnoy sredy i ocenka tehnologichnosti proizvodstva mikroshemy s uchetom stoykosti k special'nym faktoram na primere SBIS 1867VC6F / V.A. Sklyar, V.A. Smerek, K.V. Zol'nikov [i dr.] // Modelirovanie sistem i processov. - 2020. - T. 13, № 1. - S. 77-82. - DOI:https://doi.org/10.12737/2219-0767-2020-13-1-77-82.

6. Konovalov, V. Sovremennye mikroshemy maloy stepeni integracii dlya apparatury kosmicheskogo naznacheniya / V. Konovalov, V. Konyahin, S. Brazhnikov // Nanoindustriya. - 2016. - № 8 (70). -S. 32-39. - DOI:https://doi.org/10.22184/1993-8578.2016.70.8.32.38.

7. Komarov, A.S. Upravlenie tehnicheskim urovnem vysokointegrirovannyh elektronnyh sistem (nauchno-tehnologicheskie problemy i aspekty razvitiya) : monografiya / A.S. Komarov, D.V. Krapuhin, E.I. Shul'gin. - M. : Tehnosfera, 2014. - 240 s.

8. Anashin, V.S. Osobennosti processa kontrolya stoykosti EKB kosmicheskih primeneniy k vozdeystviyu ioniziruyuschih izlucheniy kosmicheskogo prostranstva / V.S. Anashin, P.A. Chubunov, A.E. Kozyukov // Mikroelektronika-2015. Integral'nye shemy i mikroelektronnye moduli: proektirovanie, proizvodstvo i primenenie: sbornik dokladov Mezhdunarodnoy konferencii. - 2016. - S. 117-119.

9. Sostoyanie razrabotok elementnoy bazy dlya sistem svyazi i upravleniya / V.K. Zol'nikov, A.Yu. Kulay, V.P. Kryukov, S.A. Evdokimova // Modelirovanie sistem i processov. - 2016. - T. 9, № 4. - S. 11-13. - DOI:https://doi.org/10.12737/24575.

10. Zol'nikov, K. V. Sovremennoe proektirovanie elektronnoy komponentnoy bazy / K. V. Zol'nikov, V.V. Lavlinskiy // Ekonomika. Innovacii. Upravlenie kachestvom. - 2015. - № 1 (10). - S. 40-41.

11. Zol'nikov, K.V. Proektirovanie special'nyh SBIS i upravlenie proektami ih sozdaniya / K.V. Zol'nikov, V.A. Smerek, T.P. Belyaeva // Intellektual'nye tehnologii buduschego. Estestvennyy i iskusstvennyy intellekt: sbornik materialov Vserossiyskoy molodezhnoy konferencii. - Voronezh: Nauchnaya kniga, 2011. - S. 218-220.

12. Opredelenie meropriyatiy po programme obespecheniya kachestva rabot proektirovaniya i seriynogo proizvodstva mikroshem i ocenki ih effektivnosti na primere SBIS 1867VN016 / K.V. Zol'nikov, A.S. Yagodkin, S.A. Evdokimova, T.V. Skvorcova // Modelirovanie sistem i processov. - 2020. - T. 13, № 1. - S. 46-53. - DOI:https://doi.org/10.12737/2219-0767-2020-13-1-46-53.

13. Optimization of the cell structure for radiation-hardened power mosfets / T. Wang, L. Zheng, X. Wan [et al.] // Electronics (Switzerland). - 2019. - T. 8, № 6. - S. 598. - DOI:https://doi.org/10.3390/electronics8060598.

14. Osobennosti proektirovaniya bazovyh elementov mikroshem kosmicheskogo naznacheniya / V.K. Zol'nikov, T.V. Skvorcova, I.I. Strukov [i dr.] // Modelirovanie sistem i processov. - 2020. - T. 13, № 3. - S. 66-70. - DOI:https://doi.org/10.12737/2219-0767-2020-13-3-66-70.

15. Zol'nikov, V.K. Proektirovanie sovremennoy mikrokomponentnoy bazy s uchetom odinochnyh sobytiy radiacionnogo vozdeystviya / V.K. Zol'nikov // Modelirovanie sistem i processov. - 2012. -№ 1. - S. 27-30.

Login or Create
* Forgot password?